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PLD systems (Pulsed laser deposition)

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PLD systems (Pulsed laser deposition)

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PLD involves the use of a high-energy laser to ablate (vaporize) a target material in a vacuum or controlled atmosphere. The ablated material is then deposited onto a substrate placed opposite the target. The laser ablation process generates a plasma plume composed of ions, atoms, and clusters of the target material, which condenses onto the substrate to form a thin film.

 

The PLD technique offers numerous advantages.

The most important are:

  • Versatility: PLD can deposit a wide range of materials, including complex compounds and multilayer structures.
  • Controlled Stoichiometry: PLD allows for precise control over the composition and stoichiometry of deposited films.
  • High Quality Films: PLD films exhibit high crystallinity and purity.
  • KENOSISTEC accompanies the customer in choosing the most appropriate PLD tool for each individual application. Furthermore, each system can be equipped with continuous monitoring such as, for example, a Reed, a normally open foil switch which closes in the presence of a magnetic field.